Introduction to Microlithography

Introduction to Microlithography
Author: L. F. Thompson
Publisher: Academic
Total Pages: 568
Release: 1994
Genre: Art
ISBN:

Reviews the theory, materials, and processes used in the lithographic process by which circuit elements are fabricated (it is these elements' decreasing size that has made possible the miniaturization of electronic devices). After a brief historical introduction, four major topics are discussed: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. The new edition reflects the many changes that have occurred since the 1983 publication of this tutorial/reference. Annotation copyright by Book News, Inc., Portland, OR

Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication

Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication
Author: P. Rai-Choudhury
Publisher: SPIE Press
Total Pages: 706
Release: 1997
Genre: Technology & Engineering
ISBN: 9780819423795

Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.

Principles of Lithography

Principles of Lithography
Author: Harry J. Levinson
Publisher: SPIE Press
Total Pages: 446
Release: 2005
Genre: Technology & Engineering
ISBN: 9780819456601

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Fundamental Principles of Optical Lithography

Fundamental Principles of Optical Lithography
Author: Chris Mack
Publisher: John Wiley & Sons
Total Pages: 503
Release: 2011-08-10
Genre: Technology & Engineering
ISBN: 1119965071

The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLABĀ®, to accompany the textbook. You can also contact the author and find help for instructors.

Lithography Process Control

Lithography Process Control
Author: Harry J. Levinson
Publisher: SPIE Press
Total Pages: 210
Release: 1999
Genre: Photography
ISBN: 9780819430526

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Field Guide to Optical Lithography

Field Guide to Optical Lithography
Author: Chris A. Mack
Publisher: Society of Photo Optical
Total Pages: 122
Release: 2006
Genre: Technology & Engineering
ISBN: 9780819462077

This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.

Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology

Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology
Author: Saburo Nonogaki
Publisher: CRC Press
Total Pages: 336
Release: 2018-10-08
Genre: Technology & Engineering
ISBN: 1482273764

"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."

Microlithography/Molecular Imprinting

Microlithography/Molecular Imprinting
Author:
Publisher: Springer Science & Business Media
Total Pages: 296
Release: 2005-02-18
Genre: Technology & Engineering
ISBN: 9783540218623

1. J.D. Marty, M. Mauzac: Molecular Imprinting: State of the Art and Perspectives.- 2. H. Ito: Chemical Amplification Resists for Microlithography

The Physics of Submicron Lithography

The Physics of Submicron Lithography
Author: Kamil A. Valiev
Publisher: Springer Science & Business Media
Total Pages: 502
Release: 2012-12-06
Genre: Science
ISBN: 146153318X

This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.