Microlithography

Microlithography
Author: Bruce W. Smith
Publisher: CRC Press
Total Pages: 770
Release: 2020-05-01
Genre: Technology & Engineering
ISBN: 1351643444

The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Handbook of VLSI Microlithography

Handbook of VLSI Microlithography
Author: John N. Helbert
Publisher: William Andrew
Total Pages: 1025
Release: 2001-04-01
Genre: Technology & Engineering
ISBN: 0815517807

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Surfactants in Precision Cleaning

Surfactants in Precision Cleaning
Author: Rajiv Kohli
Publisher: Elsevier
Total Pages: 336
Release: 2021-10-21
Genre: Technology & Engineering
ISBN: 0128222174

Surfactants in Precision Cleaning: Removal of Contaminants at the Micro and Nanoscale is a single source of information on surfactants, emulsions, microemulsions and detergents for removal of surface contaminants at the micro and nanoscale. The topics covered include cleaning mechanisms, effect of surfactants, types of stable dispersions (emulsions, microemulsions, surfactants, detergents, etc.), cleaning technology, and cleaning applications. Users will find this volume an excellent resource on the use of stable dispersions in precision cleaning. - Single source of current information on surfactants, emulsions, microemulsions and detergents for precision cleaning applications - Includes a list of extensive reference sources - Discusses specific selection and properties of surfactants and their use in cleaning - Provides a guide for cleaning applications in different industry sectors

Handbook of Silicon Semiconductor Metrology

Handbook of Silicon Semiconductor Metrology
Author: Alain C. Diebold
Publisher: CRC Press
Total Pages: 703
Release: 2001-06-29
Genre: Technology & Engineering
ISBN: 0203904540

Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay